are a series of epoxy resin type i/g line negative photoresist, which can be processed to thick film structure with vertical sidewall and aspect ratio. Tonye Su-8 are mainly used in MEMS, microfluidic chip and other fields of micromachining and microelectronics.
Tonye Su-8 model | Spin coating thickness |
Su-8 2005 | 2-8 um |
Su-8 2015 | 10-20um |
Su-8 2025 | 20-80 um |
Su-8 2050 | 40-150 um |